Latest Release

Extreme Ultraviolet Lithography

Principles and Basic Technologies

This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirror; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most practical lithographic technology for device fabrication at the less than 7-nm node.

About the Author

Hiroo Kinoshita

Hiroo Kinoshita is an expert with over 40 years’ experience in lithography. He worked for NTT and University of Hyogo, where he developed a EUVL experimental system. He has authored over 210 technical papers on EUVL.

Author is a fellow of The Optical Society and won the Joseph Fraunhofer Award/Robert M. Burley Prize from the Optical Society in 2012.

Scroll to Top